Nanocrystalline Fe thin films on Si(100) substrate

Abstract

In this research structural properties of ferromagnetic Fe thin films on semiconductor Si(100) substrate have been reported. We will present topography features of these layers by atomic force microscopy (AFM). The Fe thicknesses range from 5 to 150 nm. The Fe films through evaporation technique are successfully grown on Si substrates and the structural proprieties of them were studied due to thickness changing. We estimated root mean square (rms) between 0.5-1.5 with 450 texture direction and rms slope between 0.02-0.06 for Fe films. The XRD patterns show the formation of β-FeSi2 after annealing at 700 0C and indicate that annealing has obvious effects on the texture of the Fe-Si alloy.